In the high-stakes world of semiconductor manufacturing, even microns matter. As a specialized wafer chuck manufacturer, we engineer precision vacuum chucks, advanced electrostatic chucks (ESC), and durable metal chucks to support the most demanding processes—from ultra-thin wafer handling to high-temperature etching and high-force applications.
Whether you are running a high-volume fab or a university research lab, our chucks provide the flatness, cleanliness, and durability required for zero-defect manufacturing.

Ideal for Probing, Dicing, and Thin Wafer Handling.
Our Vacuum Wafer Chucks utilize porous ceramic or multi-zone groove technology to provide a secure, warp-free grip on the backside of the wafer. Unlike standard chucks, our design minimizes bullseye marks and edge exclusion issues.
Material Options: High-purity Alumina (Al2O3), Silicon Carbide (SiC), or Porous Ceramic
Flatness: Superior parallelism down to < 5µm
Custom Sizes: From 2" (50mm) to 12" (300mm) and irregular dies (singulation)
Applications: Probe stations, wafer grinders, laser dicing, and pick-and-place systems
Special Feature: Multi-zone vacuum control to support ultra-thin (flexible) wafers without cracking
Plasma & High-Temperature Stability.
For processes where physical contact via vacuum holes is not an option, our Electrostatic Chucks (ESC) are the solution. Using Coulombic or Johnsen-Rahbek (JR) principles, we provide a uniform clamping force across the entire wafer surface.
Technology: Coulombic Type (Alumina) & JR Type (Aluminum Nitride - AlN)
Thermal Control: Embedded heater pedestals and cooling channels for precise temperature management (-20°C to +200°C+)
Durability: Plasma-sprayed ceramic coatings to resist erosion in Etch and CVD environments
Customization: Single or bi-polar electrodes, embossed/grooved surfaces to purge backside gas (Helium) for thermal conduction
Refurbishment: We offer ESC refurbishment services to restore clamping force and extend lifespan at 40% cost of new

Ideal for High-Force Probing, Thermal Cycling, and Cost-Effective Production.
Our Metal Wafer Chucks are precision-machined from stainless steel, aluminum alloy, or tool steel for applications requiring high mechanical strength, fast thermal response, or budget-friendly solutions. These chucks are widely used in R&D, manual probe stations, and high-throughput industrial environments where ceramic chucks are not mandatory.
Material Options: Stainless Steel (304, 316), Aluminum Alloy (6061, 7075), Tool Steel
Flatness: < 10µm to < 25µm depending on material and size
Custom Sizes: From 1" (25mm) to 12" (300mm) and custom shapes for MEMS or optoelectronics
Surface Finish: Precision ground, mirror polished, or with vacuum groove patterns
Vacuum Grooves: Concentric rings, spiral patterns, or custom multi-zone designs
Applications: Manual probe stations, high-force wafer probing, thermal chuck systems (-40°C to +150°C), pick-and-place equipment, and optical inspection
Key Advantages:
Excellent thermal conductivity for fast heating and cooling
High mechanical strength for heavy-duty probing without deformation
Lower cost compared to ceramic chucks
Easy to machine for rapid prototyping and custom geometries
Optional hard coating (Ni or DLC) for wear resistance and corrosion protection
| Specification | Vacuum Chuck (Ceramic) | Electrostatic Chuck (ESC) | Metal Vacuum Chuck |
|---|---|---|---|
| Wafer Size | 50mm – 300mm (Custom) | 150mm – 300mm | 25mm – 300mm (Custom) |
| Material | Alumina (96%/99.6%), SiC | Alumina (Coulomb), AlN (JR) | Stainless Steel, Aluminum Alloy, Tool Steel |
| Flatness | < 5µm (Global) | < 10µm | < 10µm to < 25µm |
| Operating Temp | -40°C to 150°C | -20°C to 400°C+ | -40°C to +150°C |
| Surface | Mirror polish / Porous | Embossed / Grooved / Dry etching | Precision ground / Mirror polish / Grooved |
| Lead Time | 2-4 Weeks | 4-6 Weeks | 1-3 Weeks |
Don't settle for off-the-shelf solutions. We are a direct manufacturer, not a middleman. This means lower costs, faster prototyping, and full customization.
In-House Ceramic & Metal Machining – We grind, polish, and mill both hard ceramics and precision metals in-house, ensuring absolute control over surface roughness, flatness, and profile.
Cleanroom Assembly – Assembled in Class 1000 (ISO 6) cleanrooms to prevent particle contamination.
100% Tested – Every chuck is tested for clamping force, leak rate, dielectric strength (for ESC), and high voltage breakdown (for ESC).
Local Support & Speed – As your local manufacturer, we offer 24-hour quotes and rapid turnaround for custom R&D chucks, including metal prototypes.
Our wafer chucks are mission-critical in the following sectors:
Semiconductor Front-End – Plasma Etching, CVD/PVD deposition, Lithography (Stepper)
Back-End & Assembly – Wafer probing (ATE), dicing, grinding, and backside metallization
Advanced Packaging – TSV (Through Silicon Via) and wafer bonding
R&D & Metrology – Probe stations, optical inspection systems, and digital holography (DHM)
High-Force & Thermal Testing – Metal chucks for thermal cycling and heavy-duty probing
Let us know your requirements. Whether you need a 300mm Electrostatic Chuck for an AMAT / TEL tool, a custom Vacuum Chuck for a non-standard substrate, or a rapid-turnaround Metal Chuck for your probe station, we have the solution.
We are committed to being your long-term partner in the semiconductor supply chain. Let's discuss your OEM specs today.
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